JPH0260227U - - Google Patents
Info
- Publication number
- JPH0260227U JPH0260227U JP13870088U JP13870088U JPH0260227U JP H0260227 U JPH0260227 U JP H0260227U JP 13870088 U JP13870088 U JP 13870088U JP 13870088 U JP13870088 U JP 13870088U JP H0260227 U JPH0260227 U JP H0260227U
- Authority
- JP
- Japan
- Prior art keywords
- reflected light
- shutter
- light intensity
- exposure apparatus
- projection exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13870088U JPH0260227U (en]) | 1988-10-25 | 1988-10-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13870088U JPH0260227U (en]) | 1988-10-25 | 1988-10-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0260227U true JPH0260227U (en]) | 1990-05-02 |
Family
ID=31401283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13870088U Pending JPH0260227U (en]) | 1988-10-25 | 1988-10-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0260227U (en]) |
-
1988
- 1988-10-25 JP JP13870088U patent/JPH0260227U/ja active Pending
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